Neo developer "D-701"
A large amount of developer dissolution (increased liquid lifespan)! Neo developer solution.
"D-701" is an appropriate developer for liquid photoresists and alkaline-soluble photoresists such as dry films. Due to its high resolution, it reduces pattern defects (low swelling of the resist). It is very effective at removing residues such as scum. 【Features】 ■ High resist solubility (increased liquid lifespan) ■ Very easy to clean the developing machine ■ Being a solution type, it allows for easy immersion *For more details, please download the PDF or feel free to contact us.
- Company：ヤマトヤ商会 新潟営業所
- Price：Other
